|
|
|
|
|
|
|
|
|
|
INVENTORS: Partanen; Jouni P. , Los Angeles, CA Hug; William F. , Pasadena, CA
ASSIGNEES: 3D Systems, Inc., Valencia, CA
U.S. CLASS: 264/401
ABSTRACT: Embodiments of the instant invention are directed to laser exposure systems that employ a pulsed solid state laser to provide a reactive response wavelength and a pulse repetition rate specifically optimized for application to solidification of a liquid photopolymer in a stereolithographic process. The solid state laser employs two second harmonic crystals for generating an emission wavelength at about 320-345 nm and a pulse repetition rate, wherein the pulse repetition rate is selected such that a resulting pulse separation at the target surface is less than a width of the beam when the beam is being scanned at a desired velocity and an average exposure deposited by the beam is equal to a desired amount. XX