2001 (and backfills for previous years) / DB reference years
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Author Miwa-M; Juodkazis-S; Kawakami-T; Matsuo-S; Misawa-H
Source Applied-Physics-A:-Materials-Science-and-Processing. v 73 n 5 November 2001, p 561-566
Abstract We report herein a method for the three-dimensional (3D) fabrication of microstructures by means of direct fs-beam writing (scanning) inside a polymerizable resin. Photopolymerization takes place via two-photon absorption (TPA), as indicated by measurements of transmission power dependence. This concept of fabrication is based on two principles: the use of short, sub-picosecond pulses and simultaneous tight focusing (numerical aperture, NA greater than 1). This approach creates a unique opportunity for avoiding self-focusing even at very high intensities, as the power is lower than the self-focusing threshold. Under such conditions, no filament formation takes place and no thermal convection disturbance occurs in the focal vicinity during photo-polymerization. This technique requires no sacrificial layers or structures in real 3D micro-stereo-lithography. 29 Refs. (Auth abstract) XX