2001 (and backfills for previous years) / DB reference years
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Author Marcinkevicius-A; Juodkazis-S; Mizeikis-V; Matsuo-S; Misawa-H
Source Proceedings-of-SPIE-The-International-Society-for-Optical-Engineering. v 4271, 2001 p 150-158; Optical Pulse and Beam Propagation III. San Jose, CA, United States
Abstract We demonstrate a new technique for femtosecond microfabrication in transparent dielectrics, which employs non-diffracting Bessel-Gauss beams instead of commonly used Gaussian beams. The main advantage achieved this way is the ability to record linear photomodified tracks, extending along the line of non-diffracting beam propagation without sample translation, as would be required for Gaussian beams. The initial near infrared Gaussian laser beam was transformed into the non-diffracting Bessel-Gauss beam by a glass axicon (apex angle 160 deg). The beam was imaged into the bulk of the sample by a telescope consisting of two positive lenses, which allowed to vary the focusing cone angle from 5 degree to 19 degree , and maximum non-diffracting propagation distance up to 1 cm. We have recorded pre-programmed patterns of multi-shot damage tracks (diameter about 3 mum), extended uniformly along the z-axis by varying the damage spot coordinates in the x - y plane. The experiments were carried out in variou s transparent dielectrics: silica glass, sapphire, and plexyglass. Physical processes underlying the Gauss-Bessel microfabrication, and its potential applications for stereolithography, 3D microstructuring, and photonic crystal fabrication will be discussed. 25 Refs. (Auth abstract) XX