2001 (and backfills for previous years) / DB reference years
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Author Satoh, Saburoh. Tanaka, Takao. Ihara, Satoshi. Yamabe, Chobei. Institution Saga Univ, Saga, Jpn
Source Proceedings of SPIE - The International Society for Optical Engineering. v 3933 2000. Society of Photo-Optical Instrumentation Engineers, Bellingham, WA, USA. p 272-279.
Abstract For the laser stereo-lithography, a XeCl excimer lamp with cylindrical tube has been adopted to achieve a lower cost type UV light source. Because of excellent high output efficiency, it is possible to be down sizing of a power supplier and a lamp head and to be air-cooling. And moreover to extract the maximum output power and efficiency, we applied an optical fiber system for its lithography optics. With this excimer lamp the maximum UV emission per pulse 25 mu J at 100 Hz and the maximum average power 10 mW at 1000 Hz were obtained. (Auth abstract) [References: 10] XX