2000 (and backfills for previous years) / DB reference years
PREV and NEXT link to numerically adjacent references for this DATABASE UPDATE.
CONTENTS links to the title list for this UPDATE's references.
Author Yavas, O. Ochiai, C. Takai, M.
Source Applied Physics Letters. v. 76 no22, May 29 2000, p. 3319-21.
Abstract A dual-beam system composed of focused ion and electron beams for rapid prototyping of field-emitter arrays is presented. The gate openings were created by a 2-step fabrication process in which focused ion beam etching of the Nb layer was followed by wet etching of the SiO2 layer. Pt tips were deposited into these gate openings using an electron-beam-induced reaction and resulted in field emission. XX