2000 (and backfills for previous years) / DB reference years
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Author Satoh, Saburoh. Tanaka, Takao. Ihara, Satoshi. Yamabe, Chobei. Institution Saga Univ, Saga, Jpn
Source Proceedings of SPIE - The International Society for Optical Engineering. v 3888 2000. Society of Photo-Optical Instrumentation Engineers, Bellingham, WA, USA. p 264-271.
Abstract For the stereo-lithography, XeCl excimer laser has been adapted to improve the utilization efficiency of laser energy. Because of the beam uniformity was made better by a homogenizer, the quantity of cured resin per laser energy was increased compare than that without the homogenizer. With this method a simple 3D object was created, and it was proved that XeCl excimer laser was possible to apply for the stereo-lithography. (Auth abstract) [References: 9] XX