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199. UV microstereolithography system that uses spatial light modulator technology.

Author Chatwin, Chris. Farsari, Maria. Huang, Shiping.

Source Applied Optics. v. 37 no32, Nov. 10 1998, p. 7514-22.

Abstract A description of a new stereophotolithography technique that uses a spatial light modulator (SLM) to create 3-D components with a planar, layer-by-layer process of exposure. This procedure allows the building of components with dimensions in the range 50 mm-50 mm and features sizes as small as 5 mm with a resolution of 1 mm. The system comprises 8 elements, namely, a UV laser light source, an optical shutter, beam-conditioning optics, an SLM, a multielement reduction lens system, a high-resolution translation stage, a control system, and a computer-aided-design system. XX



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