1998 / DB reference year
PREV and NEXT link to numerically adjacent references for this YEAR.
CONTENTS links to the title list for this YEAR's references.
Author Nassar, R. Krishnan, A. Institution Louisiana Tech Univ, Ruston, LA, USA
Source Proceedings of SPIE - The International Society for Optical Engineering. v 3512 1998. SPIE, Bellingham, WA, USA. p 181-188. Proceedings of the 1998 Conference on Materials and Device Characterization in Micromachining. Santa Clara, CA, USA. 19980921-19980922.
Abstract Pulsed laser photoablation of polymers is a rapid prototyping technique that has applications for the manufacturing of high aspect ratio microparts. To enhance the manufacturing capability of the process, it is necessary to develop mathematical models to predict the scanning pattern of the pulsed laser on the material surface in order to etch a microstructure with a pre-specified geometry. In this study, we consider a model that predicts the number of pulses at each pixel of the surface to be scanned in order to produce a microstructure of a given geometry. In predicting the number of pulses at a pixel, the model takes into account the etch depth per pulse, the laser intensity distribution, and the geometry of the microstructure. (Auth abstract) [References: 16] XX