1998 / DB reference year
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Author Krishnan, Ashok. Nassar, Raja. Institution Louisiana Tech Univ, Ruston, LA, USA
Source Proceedings of SPIE - The International Society for Optical Engineering. v 3512 1998. SPIE, Bellingham, WA, USA. p 374-385. Proceedings of the 1998 Conference on Materials and Device Characterization in Micromachining. Santa Clara, CA, USA. 19980921-19980922.
Abstract To demonstrate proof of concept and obtain faster turnaround times on prototype development, an integrated excimer laser microfabrication system can be used for direct drawing-to-production of photoablated microstructures. A system currently in use consists of excimer lasers (248 nm and 351 nm), high-resolution stages, CAD system, and a visual observation and real-time metrology system. The material for the process is selected depending on the required edge wall definition, aspect ratio, surface roughness, and debris formation and ablation threshold. If the material is already defined, then the best process is found by selecting the following parameters: 1) machining feedrate, 2) laser pulse characteristics, 3) beam defocus, 4) number of passes, 5) laser aided cleaning, 6) high velocity gas cleaning, 7) vacuum machining. Some of the structures fabricated include microtube holders incorporating snap-fasteners for click-on microassembly. Where necessary, laser ablation is complemented by other micro machining processes like micromilling. (Auth abstract) [References: 15] XX